Method for forming vapor deposition pattern, pressing-plate-integrated type pressing member, vapor deposition apparatus, and method for producing organic semiconductor element

ABSTRACT

In a method for forming a vapor deposition pattern using a vapor deposition mask provided with a plurality of openings corresponding to a pattern that is produced by vapor deposition, and forming a vapor deposition pattern in a vapor deposition target, the method includes a close contact step of disposing the vapor deposition mask on one surface side of the vapor deposition target, disposing a pressing member and a magnetic plate in layer in this order on the other surface side of the vapor deposition target, and bringing the vapor deposition target and the vapor deposition mask into close contact with each other by using magnetism of the magnetic plate, and a vapor deposition pattern forming step of causing a vapor deposition material released from a vapor deposition source to adhere to the vapor deposition target through openings after the close contact step, and forming the vapor deposition pattern in the vapor deposition target.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. application Ser. No.15/566,321, filed Jan. 24, 2018, which in turn is the National Stageentry of International Application No. PCT/JP2016/062151, filed Apr. 15,2016, the entireties of which are incorporated herein by reference.

FIELD OF THE INVENTION

Embodiments of the present invention relate to a method for forming avapor deposition pattern, a pressing-plate-integrated type pressingmember, a vapor deposition apparatus, and a method for producing anorganic semiconductor element.

BACKGROUND OF THE INVENTION

Formation of a vapor deposition pattern using a vapor deposition mask isusually performed by bringing the vapor deposition mask provided withopenings corresponding to a pattern to be produced by vapor depositionand a vapor deposition target into close contact with each other, andcausing a vapor deposition material released from a vapor depositionsource to adhere to the vapor deposition target through the openings.

When close contact of the vapor deposition mask and the vapor depositiontarget is insufficient at the time of formation of the aforementionedvapor deposition pattern, that is, when a gap is generated between thevapor deposition mask and the vapor deposition target, reduction inprecision of the vapor deposition pattern formed in the vapor depositiontarget is caused. This is because the vapor deposition material which isreleased from the vapor deposition source and passes through theopenings goes around from the aforementioned gap when the vapordeposition pattern is formed in the vapor deposition target, and causesa problem that respective vapor deposition patterns that should beoriginally formed at a predetermined interval connect to each other bythe vapor deposition material which goes around from the gap, vapordeposition pattern dimensions become thick or the like.

As a method for bringing the vapor deposition mask and the vapordeposition target into close contact with each other, close contact by amagnetic force is generally known. In this method, a vapor depositionmask is disposed on one surface side of the vapor deposition target, amagnet is disposed on the other surface side of the vapor depositiontarget, the magnet and the vapor deposition mask attract each other bythe magnetic force, and the vapor deposition mask and the vapordeposition target are brought into close contact with each other.

When a vapor deposition mask formed from only a metal is used as thevapor deposition mask, the entire vapor deposition mask can be attractedby the magnet, and a gap is restrained from being generated between thevapor deposition mask and the vapor deposition target. However, when thevapor deposition mask formed from only a metal is used, the mass thereofalso increases with upsizing, which becomes a hindrance to handling.Further, there is the problem that it is difficult to form openingscorresponding to the pattern to be produced by vapor deposition in ametal plate with high precision by the present metal processingtechnology.

Under such circumstances, Patent Document 1 proposes a vapor depositionmask formed by stacking a metal mask provided with slits and a resinmask which is positioned on the surface of the metal mask and in whichopenings corresponding to a pattern to be produced by vapor depositionare arranged in a plurality of rows in the lengthwise and crosswisedirections. According to the vapor deposition mask proposed in PatentDocument 1, both high definition and lightweight can be satisfied evenin the case of being upsized, and moreover, formation of a vapordeposition pattern with high definition can be performed.

CITATION LIST Patent Document Patent Document 1: Japanese Patent No.5288072 SUMMARY OF THE INVENTION Technical Problem

However, when the vapor deposition mask in which the openings areprovided in the resin mask is used as proposed in Patent Document 1,regions in the vicinity of the openings of the resin mask cannot beattracted by the magnet, and when the vapor deposition mask and thevapor deposition target are brought into close contact with each otherby the magnet, gaps are generated between the vapor deposition mask andthe vapor deposition target in the regions in the vicinities of theopenings, which becomes a hindrance to forming a high-definition vapordeposition pattern.

An embodiment of the present disclosure is made in the light of thecircumstances as above, and primary objects of the embodiment of thepresent invention is to provide a method for forming a vapor depositionpattern capable of forming a high-definition vapor deposition pattern bysufficiently satisfying adhesion of a vapor deposition mask and a vapordeposition target, to provide a pressing-plate-integrated type pressingmember and a vapor deposition apparatus that are used in formation ofthe aforementioned vapor deposition pattern, and to provide a method forproducing an organic semiconductor element capable of producing anorganic semiconductor element with high precision by sufficientlysatisfying adhesion of the vapor deposition mask and the vapordeposition target.

Solution to Problem

An embodiment of the present disclosure is a method for forming a vapordeposition pattern using a vapor deposition mask provided with aplurality of openings corresponding to a pattern to be produced by vapordeposition, and forming the pattern in a vapor deposition target,wherein the vapor deposition mask includes a metal, the method includinga close contact step of disposing the vapor deposition mask on onesurface side of the vapor deposition target, disposing a pressing memberand a magnetic plate in layer in this order on the other surface side ofthe vapor deposition target, and using magnetism of the magnetic plateto bring the vapor deposition target and the vapor deposition mask intoclose contact with each other, and a vapor deposition pattern formingstep of causing a vapor deposition material released from a vapordeposition source to adhere to the vapor deposition target through theopenings after the close contact step, and forming a vapor depositionpattern in the vapor deposition target.

Further, an embodiment of the present disclosure is a method for forminga vapor deposition pattern using a vapor deposition mask provided with aplurality of openings corresponding to a pattern to be produced by vapordeposition, and forming the pattern in a vapor deposition target, themethod including a close contact step of disposing the vapor depositionmask on one surface side of the vapor deposition target, disposing apressing member on the other surface side of the vapor depositiontarget, and pressing the pressing member disposed on the other surfaceside of the vapor deposition target to the vapor deposition mask side tobring the vapor deposition target and the vapor deposition mask intoclose contact with each other, and a vapor deposition pattern formingstep of causing a vapor deposition material released from a vapordeposition source to adhere to the vapor deposition target through theopenings after the close contact step, and forming a vapor depositionpattern in the vapor deposition target.

Further, in the aforementioned method for forming a vapor depositionpattern, the close contact step may be a step of disposing the vapordeposition mask on one surface side of the vapor deposition target,disposing the pressing member on the other surface side of the vapordeposition target, and pressing the vapor deposition target to the vapordeposition mask side by a self weight of the pressing member to bringthe vapor deposition target and the vapor deposition mask into closecontact with each other. Further, in the aforementioned method forforming a vapor deposition pattern, the pressing member used in theclose contact step may be a pressing member in which a thickness changescontinuously or non-continuously toward an inner side from an outerperiphery of the pressing member. Further, the pressing member used inthe close contact step may be a pressing member in which a thicknessbecomes larger continuously or non-continuously toward an inner sidefrom an outer periphery of the pressing member.

Further, in the aforementioned method for forming a vapor depositionpattern, in the close contact step, a plurality of the pressing membershaving different thicknesses may be disposed on the other surface sideof the vapor deposition target, and the vapor deposition target and thevapor deposition mask may be brought into close contact with each other.Further, when in the close contact step, a plurality of the pressingmembers having different thicknesses are disposed on the other surfaceside of the vapor deposition target, the pressing members having largerthicknesses may be disposed toward an inner side from an outer peripheryof the vapor deposition target, and the vapor deposition target and thevapor deposition mask may be brought into close contact with each other.

Further, in the aforementioned method for forming a vapor depositionpattern, in the close contact step, a pressing plate may be disposed ona surface on a side of the pressing member that is not in contact withthe vapor deposition target in such a manner as to cover a surface ofthe pressing member, and the vapor deposition target and the vapordeposition mask may be brought into close contact with each other.Further, in the close contact step, a pressing-plate-integrated typepressing member in which the pressing member and the pressing plate areintegrated with each other may be disposed on the other surface side ofthe vapor deposition target, and the vapor deposition target and thevapor deposition mask may be brought into close contact with each other.

Further, in the aforementioned method for forming a vapor depositionpattern, the vapor deposition mask for use in formation of the vapordeposition pattern may be a vapor deposition mask formed by stacking ametal mask provided with a slit, and a resin mask provided with aplurality of openings corresponding to a pattern to be produced by vapordeposition, in a position overlapping the slit.

Further, in the aforementioned method for forming a vapor depositionpattern, the vapor deposition mask for use in formation of the vapordeposition pattern may be a vapor deposition mask in which a metal maskprovided with a plurality of slits and a resin mask provided withopenings needed to configure a plurality of screens are stacked, andeach of the slits is provided in a position overlapping at least oneentire screen.

Further, in the aforementioned method for forming a vapor depositionpattern, in the close contact step, the pressing member may be disposedin at least one portion of a region overlapping the slit in a thicknessdirection, on the other surface side of the vapor deposition target, andthe vapor deposition target and the vapor deposition mask may be broughtinto close contact with each other.

Further, in the aforementioned method for forming a vapor depositionpattern, the vapor deposition mask for use in formation of the vapordeposition pattern may be a metal-frame-equipped vapor deposition maskformed by a vapor deposition mask being fixed to a metal frame.

Further, an embodiment of the present disclosure is a method forproducing an organic semiconductor element, and includes a vapordeposition pattern forming step of forming a vapor deposition pattern ina vapor deposition target by using a vapor deposition mask, wherein inthe vapor deposition pattern forming step, the aforementioned method forforming a vapor deposition pattern is used.

Further, an embodiment of the present disclosure is apressing-plate-integrated type pressing member, thepressing-plate-integrated type pressing member being disposed between avapor deposition target and a magnetic plate, when a vapor depositionmask including a metal is disposed on one surface side of the vapordeposition target, the magnetic plate is disposed on the other surfaceside of the vapor deposition target, and the vapor deposition target andthe vapor deposition mask are brought into close contact with each otherby using a magnetic force of the magnetic plate, wherein one or aplurality of pressing members are provided on a same surface of apressing plate.

Further, an embodiment of the present disclosure is apressing-plate-integrated type pressing member, thepressing-plate-integrated type pressing member being disposed on theother surface side of a vapor deposition target when a vapor depositionmask is disposed on one surface side of the vapor deposition target, andbeing used to press the vapor deposition target to the vapor depositionmask side to bring the vapor deposition target and the vapor depositionmask into close contact with each other, wherein one or a plurality ofpressing members are provided on a same surface of a pressing plate.

Further, an embodiment of the present disclosure is apressing-plate-integrated type pressing member, thepressing-plate-integrated type pressing member being disposed on theother surface side of a vapor deposition target when the vapordeposition mask is disposed on one surface side of the vapor depositiontarget, and being used to bring the vapor deposition target and thevapor deposition mask into close contact with each other by using a selfweight of the pressing-plate-integrated type pressing member, whereinone or a plurality of pressing members are provided on a same surface ofa pressing plate.

Further, the pressing-plate-integrated type pressing member in theaforementioned pressing-plate-integrated type pressing member may be amember in which the pressing plate and the pressing member are formedintegrally from a same kind of material.

Further, an embodiment of the present disclosure is a vapor depositionapparatus for forming a vapor deposition pattern in a vapor depositiontarget by using a vapor deposition mask including a metal, the vapordeposition apparatus including a close contact device for bringing avapor deposition target and a vapor deposition mask into close contactwith each other in a stage before forming the vapor deposition patternin the vapor deposition target, wherein the close contact device is adevice that disposes the vapor deposition mask on one surface side ofthe vapor deposition target, disposes a pressing member and a magneticplate in layer in this order, on the other surface side of the vapordeposition target, and brings the vapor deposition target and the vapordeposition mask into close contact with each other by using magnetism ofthe magnetic plate.

Further, an embodiment of the present disclosure is a vapor depositionapparatus for forming a vapor deposition pattern in a vapor depositiontarget by using a vapor deposition mask, the vapor deposition apparatusincluding a close contact device for bringing a vapor deposition targetand a vapor deposition mask into close contact with each other in astage before forming the vapor deposition pattern in the vapordeposition target, wherein the close contact device is a device thatdisposes the vapor deposition mask on one surface side of the vapordeposition target, disposes a pressing member on the other surface sideof the vapor deposition target, and presses the pressing member to thevapor deposition mask side to bring the vapor deposition target and thevapor deposition mask into close contact with each other.

Further, an embodiment of the present disclosure is a vapor depositionapparatus for forming a vapor deposition pattern in a vapor depositiontarget by using a vapor deposition mask, the vapor deposition apparatusincluding a close contact device for bringing a vapor deposition targetand a vapor deposition mask into close contact with each other in astage before forming the vapor deposition pattern in the vapordeposition target, wherein the close contact device is a device thatdisposes the vapor deposition mask on one surface side of the vapordeposition target, disposes a pressing member on the other surface sideof the vapor deposition target, and presses the vapor deposition targetto the vapor deposition mask side to bring the vapor deposition targetand the vapor deposition mask into close contact with each other, by aself weight of the pressing member.

Further, the pressing member in the aforementioned vapor depositionapparatus may be a pressing member in which a thickness changescontinuously or non-continuously toward an inner side from an outerperiphery of the pressing member. Further, in the aforementioned vapordeposition apparatus, the pressing member may be a pressing member inwhich a thickness becomes larger continuously or non-continuously towardan inner side from an outer periphery of the pressing member.

Further, the pressing member in the aforementioned vapor depositionapparatus may be a pressing-plate-integrated type pressing member inwhich one or a plurality of pressing members are provided on a samesurface of a pressing plate.

Further, the pressing member in the aforementioned vapor depositionapparatus may be a pressing-plate-integrated type pressing member inwhich a plurality of pressing members having different thicknesses areprovided on a same surface of a pressing plate.

Advantageous Effects

According to the method for forming a vapor deposition pattern, thepressing-plate-integrated type pressing member, and the vapor depositionapparatus of an embodiment of the present disclosure, adhesion of thevapor deposition mask and the vapor deposition target can besufficiently satisfied, and thereby a high-definition vapor depositionpattern can be formed. Further, according to the method for producing anorganic semiconductor element of an embodiment of the presentdisclosure, an organic semiconductor element can be produced with highprecision.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1(a) is a schematic cross-sectional view showing a state beforebringing a vapor deposition mask and a vapor deposition target intoclose contact with each other, and FIG. 1(b) is a schematiccross-sectional view showing a state at a time of the vapor depositionmask and the vapor deposition target being brought into close contactwith each other by using magnetism of a magnetic plate.

FIG. 2 is a schematic cross-sectional view of a comparative exampleshowing a state at a time of a vapor deposition mask and a vapordeposition target being brought into close contact with each other byusing magnetism of a magnetic plate.

FIG. 3 is a schematic cross-sectional view showing an example of a statebefore bringing the vapor deposition mask and the vapor depositiontarget into close contact with each other.

FIGS. 4(a) to 4(c) are elevation views of the magnetic plates as seen inplan view.

FIG. 5 is a schematic cross-sectional view showing an example of a statebefore bringing a vapor deposition mask and a vapor deposition targetinto close contact with each other.

FIGS. 6(a) and 6(b) are schematic cross-sectional views showing examplesof a state before bringing a vapor deposition mask and a vapordeposition target into close contact with each other.

FIGS. 7(a) and 7(b) are views showing an example of the vapor depositionmask for use in formation of a vapor deposition pattern of anembodiment, FIG. 7(a) is an elevation view as seen in plan view from ametal mask side, and FIG. 7(b) is a schematic cross-sectional view takenalong the line A-A in FIG. 7(a).

FIG. 8 is an elevation view of a vapor deposition mask of an example foruse in formation of a vapor deposition pattern of an embodiment as seenin plan view from a metal mask side.

FIG. 9 is a view showing a state in which dimensions of gaps are dividedinto levels.

FIGS. 10(a) and 10(b) are perspective views showing examples of apressing-plate-integrated type pressing member.

FIG. 11(a) is a schematic cross-sectional view showing a state beforebringing the vapor deposition mask and the vapor deposition target intoclose contact with each other, and FIG. 11(b) is a schematiccross-sectional view showing a state at a time of the vapor depositionmask and the vapor deposition target being brought into close contactwith each other.

FIG. 12 is a partial enlarged view showing a state in which dimensionsof gaps in a region demarcated by a slit are divided into levels.

FIG. 13 is a perspective view showing an example of the pressing member.

FIG. 14 is an elevation view of a vapor deposition mask in embodiment(A) as seen in plan view from a metal mask side.

FIG. 15 is an elevation view of the vapor deposition mask in embodiment(A) as seen in plan view from the metal mask side.

FIG. 16 is an elevation view of the vapor deposition mask in embodiment(A) as seen in plan view from the metal mask side.

FIGS. 17(a) and 17(b) are both elevation views of the vapor depositionmask in embodiment (A) as seen in plan view from the metal mask side.

FIG. 18 is an elevation view of a vapor deposition mask in embodiment(B) as seen in plan view from a metal mask side.

FIG. 19 is an elevation view of the vapor deposition mask in embodiment(B) as seen in plan view from the metal mask side.

FIG. 20 is an elevation view showing an example of ametal-frame-equipped vapor deposition mask.

FIG. 21 is an elevation view showing an example of themetal-frame-equipped vapor deposition mask.

FIGS. 22(a) to 22(c) are elevation views showing examples of a metalframe.

FIG. 23 is a schematic cross-sectional view showing a state at a time ofthe vapor deposition mask and the vapor deposition target being broughtinto close contact with each other by using a self weight of thepressing member.

FIG. 24 is a schematic cross-sectional view showing a state at a time ofthe vapor deposition mask and the vapor deposition target being broughtinto close contact with each other by using a self weight of thepressing-plate-integrated type pressing member.

DETAILED DESCRIPTION OF THE INVENTION

Hereafter, a method for forming a vapor deposition pattern of anembodiment of the present disclosure is specifically described using thedrawings.

<<Method for Forming Vapor Deposition Pattern>>

A method for forming a vapor deposition pattern of an embodiment of thepresent disclosure (hereafter, referred to as a method for forming avapor deposition pattern of an embodiment) is a method using a vapordeposition mask provided with a plurality of openings corresponding to apattern to be produced by vapor deposition, and forming a vapordeposition pattern in a vapor deposition target, and it is characterizedin that the method, as shown in FIGS. 1(a) and 1(b), includes a closecontact step of disposing a vapor deposition mask 100 on one surfaceside (an undersurface side, in a mode shown in the figures) of a vapordeposition target 200, disposing a magnetic plate 150 on the othersurface side (a top surface side in the mode shown in the figures) ofthe vapor deposition target 200, and bringing the vapor deposition mask100 and the vapor deposition target 200 into close contact with eachother by using magnetism of the magnetic plate 150, and a vapordeposition pattern forming step of causing a vapor deposition materialreleased from a vapor deposition source to adhere to the vapordeposition target 200 through openings 25 after the close contact step,and forming the vapor deposition pattern in the vapor deposition target200, wherein in the close contact step, pressing members 130 aredisposed between the vapor deposition target 200 and the magnetic plate150, and the vapor deposition mask 100 and the vapor deposition target200 are brought into close contact with each other. Note that FIG. 1(a)is a schematic cross-sectional view showing a state before bringing thevapor deposition mask 100 and the vapor deposition target 200 into closecontact with each other, and FIG. 1(b) is a schematic cross-sectionalview showing a state at a time of the vapor deposition mask 100 and thevapor deposition target 200 being brought into close contact with eachother.

<Close Contact Step>

As shown in FIG. 1(a), the close contact step is a step of disposing thevapor deposition mask 100 including a metal on one surface side of thevapor deposition target 200, disposing the magnetic plate 150 on theother surface side of the vapor deposition target 200, and bringing thevapor deposition mask 100 and the vapor deposition target 200 into closecontact with each other by using magnetism of the magnetic plate 150.The method for forming a vapor deposition pattern of an embodiment ischaracterized in that in the close contact step, the pressing members130 are disposed between the vapor deposition target 200 and themagnetic plate 150, and the vapor deposition mask 100 and the vapordeposition target 200 are brought into close contact with each other. Inother words, it is characterized in that the pressing members 130 andthe magnetic plate 150 are overlapped in this sequence on the othersurface side of the vapor deposition target, and thereby the vapordeposition mask 100 and the vapor deposition target 200 are brought intoclose contact with each other.

According to the method for forming a vapor deposition pattern of anembodiment including the close contact step of the aforementionedcharacteristic, by properly disposing the pressing members 130 betweenthe vapor deposition target 200 and the magnetic plate 150, the vapordeposition mask 100 and the vapor deposition target 200 can be broughtinto close contact with each other without a gap, and it is possible toperform formation of a high-definition vapor deposition pattern.

Hereafter, with respect to adhesion of the vapor deposition mask 100 andthe vapor deposition target 200 at the time of the vapor deposition mask100 and the vapor deposition target 200 being brought into close contactwith each other by using the magnetism of the magnetic plate 150,superiority of the method for forming a vapor deposition pattern of anembodiment is described while being compared with an example of a casein which no pressing member 130 is disposed. Note that on explaining thesuperiority of the method for forming a vapor deposition pattern of anembodiment, the vapor deposition mask 100 which is formed by stacking ametal mask 10 provided with slits 15 and a resin mask 20 provided with aplurality of openings 25 corresponding to a pattern to be produced byvapor deposition, in positions overlapping the slits 15, is described bybeing cited as an example of the vapor deposition mask 100.

In the close contact step, the vapor deposition mask 100 is disposed onone surface side of the vapor deposition target 200, the magnetic plate150 is disposed on the other surface side of the vapor deposition target200, and the magnetic plate 150 and the vapor deposition mask 100 areattracted to each other by using the magnetism of the magnetic plate150, whereby the vapor deposition mask 100 and the vapor depositiontarget 200 are brought into close contact with each other. Of theregions of the vapor deposition mask 100, regions capable of beingattracted by the magnetic plate 150 are regions that overlap portionsconstituted of a metal material in a thickness direction, that is,regions overlapping metal portions which are no-slit-formation regionsof the metal mask 10 (Hereafter, the metal portions which is theno-slit-formation regions of the metal mask 10 are sometimes referred tosimply as “metal portions”.) in the thickness direction, and in theregions where the resin mask 20 constituted of a resin material onlyoverlaps the magnetic plate 150 in the thickness direction, the vapordeposition mask 100 and the magnetic plate 150 cannot attract eachother.

FIG. 2 is a comparative example that does not satisfy conditions of theclose contact step of the method for forming a vapor deposition patternof an embodiment, and is a schematic cross-sectional view showing astate at a time of the vapor deposition mask 100 and the vapordeposition target 200 being brought into close contact with each otherwithout disposing the pressing member 130 between the vapor depositiontarget 200 and the magnetic plate 150. As described above, the vapordeposition mask 100 formed by stacking the metal mask 10 provided withthe slits 15 and the resin mask 20 provided with a plurality of openings25 corresponding to the pattern to be produced by vapor deposition, inthe positions overlapping the slits 15, and the magnetic plate 150 canattract each other in the regions (regions that overlap regions shown byreference signs X in FIG. 2 in the thickness direction) where the metalportions of the vapor deposition mask and the magnetic plate 150 overlapone another in the thickness direction, and the regions that overlaponly the resin mask 20 constituted of a resin material in the thicknessdirection cannot be attracted by the magnetic plate 150. Accordingly, agap tends to be generated between the vapor deposition mask 100 and thevapor deposition target 200 in the regions that cannot be attracted bythe magnetic plate 150, that is, portions where the slits 15 of themetal mask 10 and the vapor deposition target 200 overlap one another inthe thickness direction.

Thus, the method for forming a vapor deposition pattern of an embodimentis characterized in that in order to restrain a gap from being generatedbetween the vapor deposition mask 100 and the vapor deposition target200 in the positions overlapping, in the thickness direction, theregions of the vapor deposition mask 100 that cannot be attracted by themagnetic plate 150, in the close contact step, the pressing member 130is disposed between the vapor deposition target 200 and the magneticplate 150, and the vapor deposition mask 100 and the vapor depositiontarget 200 are brought into contact with each other.

According to the close contact step having the aforementionedcharacteristic, as shown in FIG. 1(b), when the vapor deposition mask100 and the vapor deposition target 200 are brought into close contactwith each other by using the magnetism of the magnetic plate 150, thevapor deposition target 200 can be pressed to a vapor deposition mask100 side by the pressing members 130 disposed between the vapordeposition target 200 and the magnetic plate 150. The vapor depositiontarget 200 which is pressed to the vapor deposition mask 100 side playsa role of burying the gap between the vapor deposition mask 100 and thevapor deposition target 200, and thereby a gap can be restrained frombeing generated between the vapor deposition mask 100 and the vapordeposition target 200 in the regions overlapping the pressing members130 in the thickness direction. That is, the vapor deposition mask 100and the vapor deposition target 200 can be brought into close contactwith each other with high adhesion. Note that FIG. 1(b) is a schematiccross-sectional view showing a state in which the vapor depositiontarget 200 is pressed by the pressing member 130. In a mode shown inFIG. 1, a sectional shape in the thickness direction of the vapordeposition target 200 in portions pressed by the pressing members 130 istrapezoidal, but the vapor deposition target 200 can be also pressed tobe along a shape of the pressing member 130, depending on materials ofthe vapor deposition target 200 and the pressing member 130 and theshape of the pressing member 130 (refer to FIG. 11 described later).Further, the vapor deposition target 200 can be also pressed so that thesectional shape in the thickness direction of the vapor depositiontarget 200 in the portion pressed by the pressing member 130 becomes acircular arc shape (not shown in the figure).

In the above description, as the vapor deposition mask 100, the vapordeposition mask 100 formed by stacking the metal mask 10 provided withthe slits 15, and the resin mask 20 provided with a plurality ofopenings 25 corresponding to the pattern to be produced by vapordeposition, in the positions overlapping the slits 15, is described bybeing cited as an example, but a mode of the vapor deposition mask 100for use in the method for forming a vapor deposition pattern of anembodiment and composing members of the vapor deposition mask 100 arenot limited in any case. For example, in the method for forming a vapordeposition pattern of an embodiment, a vapor deposition mask formed fromonly a metal material can be also used as the vapor deposition mask 100.When the vapor deposition mask 100 formed from only the metal materialis used, the vapor deposition mask 100 can be attracted to the magneticplate 150 in all regions of the vapor deposition mask 100, and adhesionof the vapor deposition mask 100 and the vapor deposition target at thetime of the vapor deposition mask 100 and the magnetic plate 150attracting each other can be enhanced as compared with the vapordeposition mask 100 including the resin material as a compositionmember. However, with the vapor deposition mask 100 formed from only ametal material, the vapor deposition mask 100 and the magnetic plate 150sometimes cannot attract each other sufficiently depending on a ratio ofa metal part, and a material of the metal, and therefore a gap issometimes generated between the vapor deposition mask 100 and the vapordeposition target 200.

The method for forming a vapor deposition pattern of an embodiment ispreferable in the case of using the vapor deposition mask 100 includinga resin material in the composition members. Specifically, it ispreferable in the case of using the vapor deposition mask 100 having aregion that cannot attract the magnetic plate 150 when the vapordeposition mask 100 and the magnetic plate 150 attract each other, thatis, vapor deposition mask 100 formed from only a resin material, and thevapor deposition mask 100 formed by stacking the resin mask 20 and themetal mask 10 as described above. Note that in the case of adopting thevapor deposition mask 100 formed from only a resin material, no regionthat can attract the magnetic plate 150 is present in the vapordeposition mask 100, and in this state, the vapor deposition mask 100and the magnetic plate 150 cannot attract each other. In this case, ametal-frame-equipped vapor deposition mask formed by fixing the vapordeposition mask formed from only a resin material to a metal frame isadopted, and thereby a frame body portion of the metal frame and themagnetic plate 150 can attract each other. The metal frame is describedlater.

An arrangement position of the pressing member 130 is not speciallylimited, and the pressing member 130 can be disposed in a positionoverlapping a region where adhesion of the vapor deposition mask 100 andthe vapor deposition target 200 is insufficient when the vapordeposition mask 100 and the vapor deposition target 200 are brought intoclose contact with each other. For example, it is preferable to disposethe pressing member 130 in the positions overlapping the slits 15 of themetal mask 10, between the vapor deposition target 200 and the magneticplate 150, in the aforementioned vapor deposition mask 100.

Between the vapor deposition target 200 and the magnetic plate 150, aplurality of pressing members 130 may be disposed as shown in FIG. 1(a),or only one pressing member 130 may be disposed as shown in FIG. 3.

The material of the pressing member 130 is not limited in any case, andmay be a metal material, a resin material, a ceramics material, a glassmaterial or any material other than these materials. Above all, a resinmaterial is preferable in a point that the resin material can uniformlypress the vapor deposition target in contact with the pressing member130 and a sufficient pressing effect can be obtained, as compared with ametal material. As the resin material, a polyimide resin or the like canbe cited, for example.

Further, a shape of the pressing member 130 on a side in contact withthe vapor deposition target 200 may be an R shape, in other words, theshape on the contacting side may be a shape having a curvature (notshown in the figure). A direction of the curvature is not limited, andthe shape may have a curvature in a longitudinal direction of thepressing member 130, or may have the curvature in a short sidedirection. Alternatively, the shape may have the curvature like asemispherical shape. The shape of the pressing member 130 on the side incontact with the vapor deposition target 200 is formed in the shapehaving a curvature, and thereby the pressing effect of the vapordeposition target by the pressing member 130 can be enhanced.

Further, when an area of the other surface side of the vapor depositiontarget overlapping the vapor deposition mask 100 in the thicknessdirection at the time of the other surface side of the vapor depositiontarget being seen in plan view is set as 100%, a total area of theportion where the pressing member 130 and the vapor deposition targetare in contact with each other is preferably 10% or more, is morepreferably 25% or more, and is specially preferably 85% or more. Bysetting the area of the portion where the pressing member and the vapordeposition target are in contact with each other at 10% or more, furtherenhancement of adhesion of the vapor deposition mask 100 and the vapordeposition target 200 can be achieved.

Note that in the case of using a plurality of pressing members 130, anarea of a portion where one pressing member 130 and the vapor depositiontarget 200 which is in contact with the one pressing member 130 ispreferably 200 mm² or more. By setting the area of the portion where theone pressing member 130 and the vapor deposition target 200 are incontact with each other within the aforementioned preferable range,stress can be restrained from being exerted intensively to the region ofthe vapor deposition target 200 which is in contact with the onepressing member 130. In other words, when the vapor deposition mask 100and the vapor deposition target 200 are attracted by the magnetic plate150, the stress which is exerted on the region of the vapor depositiontarget 200 which is in contact with the one pressing member 130 can besufficiently dispersed.

A thickness of the pressing member 130 is not specially limited, and canbe properly set with consideration given to the gap that can begenerated between the vapor deposition mask 100 and the vapor depositiontarget 200. The thickness of the pressing member 130 as an example isabout 0.01 mm to about 2 mm, about 0.05 mm to about 1 mm, and about 0.1mm to about 0.7 mm.

The magnetic plate 150 which is disposed on the pressing member 130, ora pressing plate 135 which is described later is a plate piece formedfrom a magnetic material, and a conventionally known material that canattract a metal material, for example, a conventionally known materialcan be properly selected and used, which can attract the metal portionof the metal mask 10 in the case of using the vapor deposition mask 100or the like including the metal mask 10, and a frame portion of a metalframe in the case of using a metal-frame-equipped vapor deposition maskformed by fixing the vapor deposition mask 100 to the metal frame. As anexample of the magnetic plate 150, a magnet (magnet), a magnet sheetformed by mixing a magnetic material into a synthetic rubber and thelike can be cited.

An arrangement position of the magnetic plate 150 is not speciallylimited, but in the method for forming a vapor deposition pattern of anembodiment, the magnetic plate 150 is disposed so as to cover at least apart of a surface of the pressing member 130, or at least a part of asurface of the pressing plate 135 described later, in such a manner thatthe metal portions of the vapor deposition mask and an effective portionof the magnetic plate 150 overlap one another in the thicknessdirection. Alternatively, the magnetic plate 150 is disposed so as tocover at least a part of the surface of the pressing member 130, or atleast a part of the surface of the pressing plate 135 described later,in such a manner that the frame body portion of the metal frameconstituting the metal-frame-equipped vapor deposition mask and theeffective portion of the magnetic plate 150 overlap each other in thethickness direction. In the latter case, the magnetic plate 150 also canbe disposed in such a manner that the metal portion of the vapordeposition mask, the frame body portion of the metal frame, and theeffective portion of the magnetic plate 150 overlap one another in thethickness direction. The magnetic plate is disposed so that the metalportion of the vapor deposition mask, or the frame body portion of themetal frame and the effective portion of the magnetic plate 150 overlapseach other in the thickness direction, because when the metal portion orthe frame body portion of the metal frame, and the effective portion ofthe magnetic plate 150 do not overlap each other in the thicknessdirection, the vapor deposition mask 100 and the magnetic plate 150cannot be caused to attract each other by using the magnetic force ofthe magnetic plate.

The shape of the magnetic plate 150 is not specially limited as long asthe metal portion of the vapor deposition mask, or the frame bodyportion of the metal frame, and the effective portion of the magneticplate 150 can overlap each other in the thickness direction when themagnetic plate 150 is disposed on the vapor deposition target 200 viathe pressing plate 135, as described above. For example, a shape of themagnetic plate 150 as seen in plan view can be an optional shape, suchas the shapes provided with through-holes to leave the effective portionof the magnetic plate partially as shown in FIGS. 4(a) and 4(b), and theshape in which the all regions are made of the effective portion of themagnetic plate, without providing a through-hole, as shown in FIG. 4(c).Further, in the mode shown in the figure, an outer shape of the magneticplate 150 as seen in plan view is a rectangular shape, but may be apolygon such as a rhombus, or may be a shape having a curvature such asa circle and an ellipse, for example.

A thickness of the magnetic plate 150 can be determined with a magneticforce or the like of the magnetic plate 150 taken into consideration,and is not specially limited, but as an example, is about 1 mm to about30 mm, and preferably about 10 mm to about 25 mm.

Further, when a plurality of pressing members 130 are disposed on theother surface of the vapor deposition target, if the aforementionedconditions are satisfied, one large-sized magnetic plate 150 (refer toFIG. 1) may be disposed to cover the surfaces of the plurality ofpressing members 130 collectively, or the magnetic plate 150 may bedisposed on each of the pressing members 130 as shown in FIG. 5.

Note that in the case of using the magnetic plates 150 provided withthrough-holes as shown in FIGS. 4(a) and 4(b), there can arise a case inwhich the effective portion of the magnetic plate 150 and the surface ofthe pressing member 130 do not overlap each other in the thicknessdirection depending on the position of the through-hole provided in themagnetic plate 150, and the vapor deposition target 200 cannot bepressed to the vapor deposition mask 100 side when the magnetic plate150 and the vapor deposition mask 100 attract each other. For example,when the entire surface of the pressing plate overlaps the through-holein the thickness direction, the vapor deposition target 200 cannot bepressed to the vapor deposition mask 100 side when the magnetic plate150 and the vapor deposition mask 100 attract each other.

Accordingly, in such a case, as shown in FIG. 6(a), it is preferable todispose the pressing plate 135 which overlaps at least a part of thesurface of the pressing member 130 and the effective portion of themagnetic plate 150 in the thickness direction between the pressingmember 130 and the magnetic plate 150, and bring the vapor depositionmask 100 and the vapor deposition target 200 into close contact witheach other. By disposing the pressing plate 135 like this, the pressingmember 130 can be pressed to a vapor deposition target 200 side by thepressing plate 135 even if the shape of the magnetic plate 150, forexample, the shape of the magnetic plate 150 as seen in plan view is theshape as shown in FIG. 4(a) or 4(b). That is, the pressing member 130can be pressed to the vapor deposition target 200 side regardless of theshape of the magnetic plate 150. Further, when the shape of the magneticplate 150 as seen in plan view is the shape as shown in FIG. 4(c), thepressing plate 135 may be disposed between the pressing member 130 andthe magnetic plate 150 as shown in FIG. 6(b).

Further, a pressing-plate-integrated type pressing member 140 can bealso used, that is formed by one or a plurality of pressing members 130being fixed to the pressing plate 135 (in the mode shown in the figure,a plurality of pressing members 130 are fixed to the pressing plate135). For example, according to the pressing-plate-integrated typepressing member 140 formed by a plurality of pressing members 130 beingfixed to the pressing plate 135, a plurality of pressing members 130 canbe disposed on the vapor deposition target 200 by one operation, andenhancement in productivity can be achieved more than when the pluralityof pressing members 130 are individually disposed on the vapordeposition target 200. Further, when a plurality of pressing members 130are individually disposed on the vapor deposition target 200, therespective pressing members 130 tend to deviate from the disposedpositions when the pressing plate 135 or the magnetic plate 150 isdisposed on the plurality of pressing members 130 thereafter. On theother hand, according to the pressing-plate-integrated type pressingmember 140, the respective pressing members 130 are integrated with thepressing plate 135, and therefore, the pressing-plate-integrated typepressing member 140 has an advantage that the pressing members 130 aremore difficult to deviate than in the case of the plurality of pressingmembers 130 being individually disposed.

Although it depends on the thickness of the pressing member 130, thepressing plate 135 hardly contacts the vapor deposition target 200directly when the pressing plate 135 is disposed between the pressingmember 130 and the magnetic plate 150, or the pressing-plate-integratedtype pressing member 140 is disposed between the vapor deposition target200 and the magnetic plate 150, and even when the pressing plate 135 andthe vapor deposition target 200 are in contact with each other, thestrength with which the pressing plate 135 itself presses the vapordeposition target 200 to the vapor deposition mask 100 side is weak.That is, the pressing plate 135 does not directly act on pressing thevapor deposition target by the pressing member 130, or a degree of theaction is small. Accordingly, the material of the pressing plate 135 isnot specially limited, but is preferably a material that does not hinderthe magnetic force of the magnetic plate 150. For example, the pressingplate is preferably formed from a nonmagnetic material. As thenonmagnetic material, aluminum, carbon, glass and the like can be cited.

Especially when the pressing plate 135 formed from a material with highheat conductivity such as an aluminum is adopted, at the time of vapordeposition using the method for forming a vapor deposition pattern of anembodiment, the pressing plate 135 plays a role as a cleaning plate thatlets heat exerted on the vapor deposition mask 100 escape, in otherwords, cools the vapor deposition mask, and can restrain the vapordeposition mask 100 from expanding or the like by the heat at the timeof vapor deposition.

The thickness of the pressing plate 135 is not specially limited, but isabout 1 mm to about 30 mm, as an example. As the pressing member 130which is fixed to the pressing plate 135, what is described above can beproperly selected and used, and detailed explanation here is omitted.

Hereafter, a preferable mode of the pressing member 130 is explained byciting the vapor deposition mask 100 which is used in the method forforming a vapor deposition pattern of an embodiment as an example.

(Example of Vapor Deposition Mask for Use in Method for Forming VaporDeposition Pattern of Embodiment)

The vapor deposition mask (hereafter, referred to as the vapordeposition mask of an embodiment) as an example for use in the methodfor forming a vapor deposition pattern of an embodiment adopts astructure formed by stacking the metal mask 10 in which the slits 15 areformed and the resin mask 20 in which the openings 25 corresponding tothe pattern to be produced by vapor deposition are formed in thepositions overlapping the slits, as shown in FIG. 7.

“Resin Mask”

As shown in FIG. 7, a plurality of openings 25 are provided in the resinmask 20. FIG. 7(a) is an elevation view of the vapor deposition mask foruse in the method for producing a frame-equipped vapor deposition maskof an embodiment as seen in plan view from the metal mask side, and FIG.7(b) is a schematic cross-sectional view taken along the line A-A inFIG. 7(a).

While in the mode shown in the figure, the opening shape of the opening25 exhibits a rectangular shape, the opening shape is not speciallylimited, and may be any shape as long as it is the shape correspondingto the pattern to be produced by vapor deposition. For example, theopening shape of the opening 25 may be rhombic or polygonal or may be ashape having a curvature such as a circle and an ellipsoid. Note that itcan be said that the rectangular or polygonal opening shape is apreferable opening shape of the opening 25 in a point that a large areaof light emission can be taken as compared with the opening shape havinga curvature such as a circle and an ellipsoid.

The material of the resin mask 20 is not limited, but, for example, amaterial that enables formation of the opening 25 with high definitionby laser processing or the like, has a low rate of dimensional changeand a low rate of humidity absorption under heat and with passage oftime, and is light weight, is preferably used. As such materials, apolyimide resin, a polyamide resin, a polyamide-imide resin, a polyesterresin, a polyethylene resin, a polyvinylalcohol resin, a polypropyleneresin, a polycarbonate resin, a polystyrene resin, a polyacrylonitrileresin, an ethylene-vinyl acetate copolymer resin, anethylene-vinylalcohol copolymer resin, an ethylene-methacrylic acidcopolymer resin, a polyvinyl chloride resin, a polyvinylidene chlorideresin, cellophane, an ionomer resin and the like can be cited. Among thematerials shown above by way of example, the resin materials with thethermal expansion coefficients of about 16 ppm/° C. or less arepreferable, the resin materials with the rates of humidity absorption ofabout 1.0% or less are preferable, and the resin materials includingboth the conditions are particularly preferable. By adopting the resinmask using these resin materials, dimensional precision of the openings25 can be improved, and a rate of dimensional change and a rate ofhumidity absorption under heat and with passage of time can be reduced.

The thickness of the resin mask 20 is not specially limited, but, in thecase of further improving the effect of suppressing generation of ashadow, the thickness of the resin mask 20 is preferably about 25 μm orless, more preferably less than about 10 μm. A preferable range of thelower limit value is not specially limited, but, in the case where thethickness of the resin mask 20 is less than about 3 μm, defects such asa pinhole tend to arise and a risk of deformation or the like increases.In particular, by setting the thickness of the resin mask 20 to be about3 μm or more and less than about 10 μm, more preferably about 4 μm ormore and about 8 μm or less, the influence of a shadow in formation of ahigh-definition pattern exceeding 400 ppi can be more effectivelyprevented. Further, while the resin mask 20 may be directly bonded tothe metal mask 10 described later or may be bonded thereto via anadhesive layer, in the case where the resin mask 20 is bonded to themetal mask 10 via the adhesive layer, the total thickness of the resinmask 20 and the adhesive layer is preferably within the aforementionedpreferable thickness range. Note that the shadow is a phenomenon that apart of a vapor deposition material released from a vapor depositionsource collides with inner wall surfaces of the slit of the metal maskand the opening of the resin mask and does not reach the vapordeposition target, and thereby, a portion without vapor deposition thathas a film thickness smaller than the intended vapor deposition filmthickness arises.

The sectional shape of the opening 25 is not specially limited, and endsurfaces that face each other and are of the resin mask forming theopening 25 may be substantially parallel to each other, but as shown inFIG. 7(b), the sectional shape of the opening 25 is preferably the shapehaving broadening toward a vapor deposition source. In other words, itpreferably has a taper surface having broadening toward the metal mask10 side. While a taper angle can be properly set with the thickness orthe like of the resin mask 20 taken into consideration, an angle formedby a straight line connecting a lower bottom distal end in the openingof the resin mask and an upper bottom distal end in the opening of thesame resin mask and the bottom surface of the resin mask, in otherwords, an angle formed by an inner wall surface of the opening 25 and asurface of the resin mask 20 on the side that is not in contact with themetal mask 10 (an undersurface of the resin mask in the mode shown inthe figure) in the cross section in the thickness direction of the innerwall surface constituting the opening 25 of the resin mask 20 ispreferably within a range of about 5° to about 85°, more preferablywithin a range of about 15° to about 75°, further more preferably withina range of about 25° to about 65°. In particular, within this range, itis preferably an angle smaller than a vapor deposition angle of a vapordeposition machine to be used. Moreover, in the mode shown in thefigure, while an end surface that forms the opening 25 exhibits a linearshape, it is not limited thereto but may be in a curved shape convexoutward, in other words, a shape of the entire opening 25 may be a bowlshape.

“Metal Mask”

As shown in FIG. 7(b), the metal mask 10 is stacked on one surface ofthe resin mask 20. The metal mask 10 is formed from a metal, in whichthe slits 15 extending in the lengthwise direction or the crosswisedirection are disposed. The slit 15 is synonymous with an opening. Anarrangement example of the slits is not specially limited, and the slitsextending in the lengthwise direction and the crosswise direction may bearranged in a plurality of rows in the lengthwise direction and thecrosswise direction, the slits extending in the lengthwise direction maybe arranged in a plurality of rows in the crosswise direction, or theslits extending in the crosswise direction may be arranged in aplurality of rows in the lengthwise direction. Further, they may bearranged in only one row in the lengthwise direction or the crosswisedirection. Note that “lengthwise direction” and “crosswise direction”mentioned in the specification of the present application indicate thevertical direction and the horizontal direction in the drawings,respectively, and may be any directions of the longitudinal directionand the width direction of the vapor deposition mask, the resin mask andthe metal mask. For example, the longitudinal direction of the vapordeposition mask, the resin mask and the metal mask may be set to be the“lengthwise direction”, or the width direction thereof may be set to bethe “lengthwise direction”. Moreover, while in the specification of thepresent application, the case where the shape of the vapor depositionmask as seen in plan view is a rectangular shape is described as anexample, it may be another shape such, for example, as a circular shapeand a polygonal shape such as a rhombic shape. In this case, alongitudinal direction of a diagonal line, a radial direction, or anydirection only has to be set as the “longitudinal direction”, and thedirection perpendicular to the “longitudinal direction” is set as the“width direction (sometimes referred to as a short-side direction)”.

The material of the metal mask 10 is not specially limited, but aconventionally known one in the field of the vapor deposition mask canbe properly selected and used, and, for example, a metal material suchas stainless steel, an iron-nickel alloy and an aluminum alloy can becited. Above all, an invar material which is an iron-nickel alloy can bepreferably used since an invar material is hardly deformed by heat.

While the thickness of the metal mask 10 is not specially limited, inorder to more effectively prevent generation of a shadow, it ispreferably about 100 μm or less, more preferably about 50 μm or less,and particularly preferably about 35 μm or less. Note that, in the caseof being thinner than about 5 μm, risks of rupture and deformation tendto increase and handling tends to become difficult.

Further, while in the mode shown in FIG. 7(a), the shape of the openingof the slit 15 as seen in plan view exhibits a rectangular shape, theopening shape is not specially limited, but the opening shape of theslit 15 may be any shape such as a trapezoid and a circle.

The sectional shape of the slit 15 formed in the metal mask 10 is notspecially limited, but is preferably a shape having broadening towardthe vapor deposition source as shown in FIG. 7(b). More specifically, anangle formed by a straight line connecting the lower bottom distal endin the slit 15 of the metal mask 10 and the upper bottom distal end inthe slit 15 of the same metal mask 10, and the bottom surface of themetal mask 10, in other words, an angle formed by the inner wall surfaceof the slit 15 and the surface of the metal mask 10 on the side incontact with the resin mask 20 (the undersurface of the metal mask inthe mode shown in the figure) in the cross section in the thicknessdirection of the inner wall surface constituting the slit 15 of themetal mask 10 is preferably within a range of about 5° to about 85°,more preferably within a range of about 15° to about 80°, further morepreferably within a range of about 25° to about 65°. In particular,within this range, it is preferably an angle smaller than a vapordeposition angle of a vapor deposition machine to be used.

A method of stacking the metal mask 10 on the resin mask is notspecially limited, but the metal mask 10 may be pasted on the resin mask20 using various adhesive agents, or the resin mask that hasself-adhesion may be used. The dimensions of the resin mask 20 and themetal mask 10 may be the same or may be different dimensions. Note thatwith fixation to a frame which is arbitrarily performed afterward takeninto consideration, the dimension of the resin mask 20 is preferablymade smaller than that of the metal mask 10 to set the outer peripheralportion of the metal mask 10 to be in an exposed state, whichfacilitates fixing of the metal mask 10 to the frame.

The metal mask 10 may be formed by processing a metal plate, or may beformed by using a plating method or the like. Further, the metal mask 10may be formed by the methods other than these methods.

Next, dimensions of gaps that can be generated between the vapordeposition mask 100 and the vapor deposition target 200 when in theclose contact step, a vapor deposition mask shown in FIG. 8 is disposedon one surface of the vapor deposition target 200, the magnetic plate150 is disposed on the other surface of the vapor deposition target 200,and the vapor deposition mask 100 and the vapor deposition target 200are brought into close contact with each other by using the magnetism ofthe magnetic plate 150 are described with a preferable mode of thepressing member 130.

The vapor deposition mask shown in FIG. 8 is provided with a pluralityof slits 15 (“18” slits) in the metal mask 10, and a plurality ofopenings 25 that are provided in the resin mask 20 are demarcated by theplurality of slits 15. Note that FIG. 8 is an elevation view of thevapor deposition mask 100 as seen in plan view from the metal mask side.

When attention is paid to gaps that can be generated between the vapordeposition mask 100 and the vapor deposition target 200 when the vapordeposition mask shown in FIG. 8 is used, the dimensions of the gapsgenerated between the vapor deposition mask 100 and the vapor depositiontarget 200 become larger toward an inner side from an outer periphery ofthe vapor deposition mask 100, in other words, toward an inner side froman outer periphery of the vapor deposition target 200, and inparticular, the tendency becomes larger as the vapor deposition mask 100is upsized. In short, the gaps tend to be large in a vicinity of a vapordeposition mask center at the time of the vapor deposition mask 100being seen in plan view. This is considered to be due to the self weightof the vapor deposition mask 100. FIG. 9 is a view showing a state ofthe vapor deposition mask shown in FIG. 8 seen in plan view from themetal mask 10 side, and the dimensions of the gaps that can be generatedbetween the vapor deposition mask 100 and the vapor deposition target200 are divided into levels of “A”, “B” and “C” for each regionoverlapping each of the slits 15. Note that the dimensions of the gapsare increasing in the order of “A”, “B” and “C”.

In disposing the pressing member 130 between the vapor deposition target200 and the magnetic plate 150, it is preferable to properly dispose thepressing members 130 having different thicknesses (“a mode A of thepreferable pressing member”) with the dimensions of the gaps that can begenerated between the vapor deposition mask 100 and the vapor depositiontarget 200 taken into consideration. To be specific, as shown in FIG.10(a), it is preferable to dispose the pressing members 130 havinglarger thicknesses toward the inner side from the outer periphery of thevapor deposition target 200. More specifically, it is preferable todispose the pressing members 130 having large thicknesses on regionscorresponding to the aforementioned “C”, and dispose the pressingmembers 130 having smaller thicknesses continuously or non-continuouslyon “B” and “A”. Note that the thickness of the pressing member 130mentioned here means a height from the bottom surface of the pressingmember 130 to an apex or a top surface of the pressing member that islocated in the farthest position from the bottom surface. FIG. 10(a) isa perspective view showing an example of the pressing-plate-integratedtype pressing member 140, a plurality of pressing members 130 havingdifferent thicknesses are fixed onto the pressing plate 135 so that thepressing members having larger thicknesses are located toward an innerside from an outer periphery thereof.

Note that the above is an example of a case where a plurality ofpressing members 130 with the thicknesses made to differ are disposed,and the plurality of pressing members 130 with the thicknesses made todiffer can be properly disposed in accordance with the dimensions or thelike of the gaps. For example, the pressing members having smallthicknesses may be disposed toward the inner side from the outerperiphery of the vapor deposition target 200, or a plurality of pressingmembers 130 having different thicknesses may be disposed at random.Further, as shown in FIG. 10(b), the thicknesses of the plurality ofpressing members may be fixed.

FIG. 12 is a partial schematic view of the dimensions of the gapsgenerated between the vapor deposition mask 100 and the vapor depositiontarget 200 in the positions overlapping the demarcated regions in thethickness direction being divided into levels of “A′”, “B′” and “C′”,with attention paid to one of the regions demarcated by the slits. Notethat the dimensions of the gaps are increasing in the order of “A′”,“B′” and “C′”. As shown in the drawing, in the region demarcated by theslit 15, the dimensions of the gaps generated between the vapordeposition mask 100 and the vapor deposition target tend to be smalleras they are closer to the metal portion of the metal mask 10, and to belarger as they are away from the metal portion. Specifically, the vapordeposition mask 100 and the magnetic plate 150 attract each other in themetal portion that are slit non-formation regions of the metal mask 10,so that a gap is not generated or a gap is small between the vapordeposition mask 100 and the vapor deposition target 200 in the vicinityof the metal portion where the vapor deposition mask 100 and themagnetic plate 150 directly attract each other, and the gaps tend to belarger as they are away from the metal portion where the vapordeposition mask 100 and the magnetic plate 150 directly attract eachother.

Accordingly, in the case of disposing the pressing member 130 in each ofthe regions demarcated by the slits, it is preferable to use thepressing member 130 (“a mode B of the preferable pressing member”) inwhich the thickness is continuously or non-continuously changing towardthe inner side from the outer periphery, with the dimensions of the gapsin the demarcated regions taken into consideration. To be specific, asshown in FIG. 13, it is preferable to use the pressing member 130 inwhich the thickness becomes larger continuously or non-continuouslytoward the inner side from the outer periphery. As the pressing memberin which the thickness is continuously changing, the pressing memberdescribed above in which the shape on the side in contact with the vapordeposition target 200 is an R shape, in other words, the shape on theside in contact is a shape having a curvature can be cited. Further, asthe pressing member in which the thickness is changing non-continuously,the pressing member in which the thickness is changing stepwise can becited, as shown in FIG. 13.

FIG. 11(a) is a schematic cross-sectional view showing a state beforethe vapor deposition mask 100 and the magnetic plate 150 attract eachother, and FIG. 11(b) is a schematic cross-sectional view showing astate at a time of the vapor deposition mask 100 and the vapordeposition target 200 being brought into close contact with each other.In a mode shown in the drawings, the pressing member 130 (the pressingmember 130 in which the thickness is changing non-continuously in themode shown in FIG. 13) in which the thickness is changing continuouslyor non-continuously toward an inner side from an outer periphery isdisposed between the vapor deposition target 200 and the magnetic plate150. As shown in FIG. 11(b), by using the pressing member 130 in whichthe thickness is changing continuously or non-continuously toward theinner side from the outer periphery, a pressing amount on the vapordeposition target which is pressed by the pressing member 130 can bechanged when the vapor deposition mask 100 and the magnetic plate 150attract each other. To be specific, in the region where the gap tends tobe generated to be large, the pressing amount on the vapor depositiontarget is increased, whereas in the region where the gap that can begenerated is small, the pressing amount on the vapor deposition targetis decreased. That is, by changing the pressing amount in response tothe dimension of the gap, the vapor deposition mask 100 and the vapordeposition target 200 can be sufficiently brought into contact with eachother. This similarly applies to the case of the aforementioned “mode Aof the preferable pressing member”.

Note that the pressing member 130 of the aforementioned preferable modeis an example of a case of disposing the pressing member 130 in theposition overlapping the region demarcated by the slit 15 when thedimensions of the gaps are changing as shown in FIG. 12 in the regiondemarcated by the slit 15, and the pressing member 130 in which thethickness is changing continuously or non-continuously can be properlydisposed in the position overlapping the region demarcated by the slit15, with the dimensions of the gaps in the region demarcated by the slit15 taken into consideration. For example, the pressing member in whichthe thickness is decreasing continuously or non-continuously toward theinner side from the outer periphery of the vapor deposition target 200may be disposed, or the pressing member 130 in which the thicknesschanges at random may be disposed.

“the mode A of the preferable pressing member” and “the mode B of thepreferable pressing member” which are described above can be combined.Note that in FIG. 10, the pressing-plate-integrated type pressing member140 is adopted, but when a part of the surface of the pressing member130 and the magnetic plate 150 overlap each other in the thicknessdirection, the pressing members 130 may be individually disposed in theposition overlapping the regions demarcated by the slits 15 in thethickness direction without using the pressing plate 135.

Further, in the mode shown in the figure, the single pressing member 130is disposed in each of the positions overlapping the regions demarcatedby the slits 15 in the thickness direction, but a plurality of pressingmembers 130 may be disposed in the position overlapping the regiondemarcated by the slit 15 in the thickness direction (not shown in thefigure). Further, as described above, when adhesion of the vapordeposition mask 100 and the vapor deposition target 200 is sufficient inthe portion near the metal portion in the region demarcated by the slit15, it is not necessary to dispose the pressing member in the positionoverlapping the entire region demarcated by the slit 15, but thepressing member 130 may be disposed in the position overlapping the spotwhere the gap can be generated in the thickness direction, in the regiondemarcated by the slit 15. As an example, it is preferable to use thepressing member 130 in which a side length of the pressing member asseen in plan view is about 50% or more of each side length of thedemarcated region, preferably about 70% or more, and dispose thepressing member 130 so that a center of the pressing member as seen inplan view overlaps the center of the region demarcated by the slit.

Hereafter, a mode of the preferable vapor deposition mask for use in themethod for forming a vapor deposition pattern of an embodiment isdescribed by citing Embodiment (A) and Embodiment (B) as examples.

<Vapor Deposition Mask of Embodiment (A)>

As shown in FIG. 14, the vapor deposition mask 100 of Embodiment (A) isa vapor deposition mask for simultaneously forming vapor depositionpatterns for a plurality of screens and it is characterized in that thevapor deposition mask 100 is formed by stacking the metal mask 10provided with a plurality of slits 15 on one surface of the resin mask20, wherein the resin mask 20 is provided with the openings 25 necessaryto constitute a plurality of screens, and each of the slits 15 isprovided in a position overlapping at least one entire screen.

The vapor deposition mask 100 of Embodiment (A) is a vapor depositionmask used for simultaneously forming vapor deposition patterns for aplurality of screens, and one vapor deposition mask 100 cansimultaneously form vapor deposition patterns corresponding to aplurality of products. “Openings” stated for the vapor deposition maskof Embodiment (A) mean patterns to be produced using the vapordeposition mask 100 of Embodiment (A), and for example, when the vapordeposition mask is used for forming an organic layer in an organic ELdisplay, the shape of the openings 25 is a shape of the organic layer.Moreover, “one screen” is constituted of an aggregate of the openings 25corresponding to one product, and when the one product is an organic ELdisplay, an aggregate of organic layers needed for forming one organicEL display, in other words, an aggregate of the openings 25 to be theorganic layers is “one screen”. Further, in the vapor deposition mask100 of Embodiment (A), in order to simultaneously form the vapordeposition patterns for the plurality of screens, the aforementioned“one screen” is arranged for each of the plurality of screens in theresin mask 20 at a predetermined interval. Namely, in the resin mask 20,the openings 25 needed to constitute the plurality of screens areprovided.

The vapor deposition mask of Embodiment (A) is characterized in that themetal mask 10 which is provided with the plurality of slits 15 isprovided on one surface of the resin mask, and each of the slits isprovided in the position overlapping at least the one entire screen. Inother words, it is characterized in that between the openings 25 neededto constitute one screen, metal line portions which have the same lengthas the length of the slit 15 in the lengthwise direction and have thesame thickness as that of the metal mask 10 do not exist between theopenings 25 adjacent in the crosswise direction, or metal line portionswhich have the same length as the length of the slit 15 in the crosswisedirection and have the same thickness as that of the metal mask 10 donot exist between the openings 25 adjacent in the lengthwise direction.Hereafter, the metal line portions which have the same length as thelength of the slit 15 in the lengthwise direction and have the samethickness as that of the metal mask 10, and the metal line portionswhich have the same length as the length of the slit 15 in the crosswisedirection and have the same thickness as that of the metal mask 10 aresometimes collectively referred to simply as metal line portions.

According to the vapor deposition mask 100 of Embodiment (A), even whenthe dimension of the openings 25 needed to constitute one screen and thepitch between the openings 25 constituting one screen are made small,for example, even when the dimension of the openings 25 and the pitchbetween the openings 25 are made extremely small in order to form ascreen exceeding 400 ppi, for example, interference by metal lineportions can be prevented, and an image with high definition can beformed. Note that when one screen is divided by a plurality of slits, inother words, when the metal line portions having the same thickness asthat of the metal mask 10 exist between the openings 25 constituting onescreen, as the pitch between the openings 25 constituting one screen issmaller, the metal line portions existing between the openings 25 morebecome a hindrance in forming the vapor deposition pattern on the vapordeposition target and it becomes more difficult to form the vapordeposition pattern with high definition. In other words, when the metalline portions having the same thickness as that of the metal mask 10exist between the openings 25 constituting one screen, the metal lineportions in the case of setting the frame-equipped vapor deposition maskcause generation of a shadow, and it becomes difficult to form a screenwith high definition.

Next, referring to FIG. 14 to FIG. 17, an example of the openings 25constituting one screen is described. Note that a region enclosed by abroken line in the modes shown in the figures is one screen. While inthe modes shown in the figures, an aggregate of a small number ofopenings 25 is one screen for convenience of explanation, the mode ofthe openings 25 is not limited to these modes, and, for example, theopenings 25 for millions of pixels may be present in one screen, whereone opening 25 is one pixel.

In the mode shown in FIG. 14, one screen is constituted of an aggregateof openings 25 having a plurality of openings 25 provided in thelengthwise direction and the crosswise direction. In the mode shown inFIG. 15, one screen is constituted of an aggregate of the openings 25having a plurality of openings 25 provided in the crosswise direction.Moreover, in the mode shown in FIG. 16, one screen is constituted of anaggregate of the openings 25 having a plurality of openings 25 providedin the lengthwise direction. Further, in FIG. 14 to FIG. 16, the slit 15is provided in a position overlapping one entire screen.

As described above, the slit 15 may be provided in the positionoverlapping only one screen, or as shown in FIGS. 17(a) and 17(b), maybe provided in a position overlapping entirety of two or more screens.In FIG. 17(a), in the vapor deposition mask 100 shown in FIG. 14, theslit 15 is provided in a position overlapping the entirety of twoscreens continuous in the crosswise direction. In FIG. 17(b), the slit15 is provided in a position overlapping entirety of three screenscontinuous in the lengthwise direction.

Next, by citing the mode shown in FIG. 14 as an example, pitches amongthe openings 25 constituting one screen and pitches among the screensare described. The pitches among the openings 25 constituting one screenand the dimension of the opening 25 are not specially limited, but canbe properly set in accordance with a pattern to be produced by vapordeposition. For example, when formation of the vapor deposition patternwith high definition of 400 ppi is performed, a pitch (P1) in thecrosswise direction and a pitch (P2) in the lengthwise direction betweenthe adjacent openings 25 in the openings 25 constituting one screen areabout 60 μm. Further, the dimension of the opening is about 500 μm² toabout 1000 μm². Moreover, one opening 25 is not limited to correspondingto one pixel, but, for example, a plurality of pixels can be alsocombined to one opening 25 depending on a pixel arrangement.

While a pitch (P3) in the crosswise direction and a pitch (P4) in thelengthwise direction between the screens are not specially limited, but,as shown in FIG. 14, when one slit 15 is provided in the positionoverlapping one entire screen, metal line portions are present betweenthe respective screens. Accordingly, when the pitch (P4) in thelengthwise direction and the pitch (P3) in the crosswise directionbetween the screens are smaller than or substantially equal to the pitch(P2) in the lengthwise direction and the pitch (21) in the crosswisedirection of the openings 25 provided in one screen, the metal lineportions existing between the respective screens are liable to break.Accordingly, with this point taken into consideration, the pitches (P3,P4) between the screens are preferably wider than the pitches (P1, P2)between the openings 25 constituting one screen. One example of thepitches (P3, P4) between the screens is about 1 mm to about 100 mm. Notethat the pitch between the screens means the pitch between the adjacentopenings in one screen and another screen adjacent to the one screen.The same similarly applies to the pitch between the openings 25 and thepitch between the screens in the vapor deposition mask of Embodiment (B)mentioned later.

Note that, as shown in FIG. 17, when one slit 15 is provided in theposition overlapping the entirety of two or more screens, metal lineportions constituting the inner wall surfaces of the slit are notpresent among the plurality of screens provided in the one slit 15.Accordingly, in this case, the pitch between the two or more screensprovided in the position overlapping the one slit 15 may besubstantially equal to the pitch between the openings 25 constitutingone screen.

Further, on the resin mask 20, grooves (not shown) that extend in thelengthwise direction or the cross wise direction of the resin mask 20may be formed. While in the case of heat being applied at the time ofvapor deposition, there is a possibility that the resin mask 20thermally expands, and thereby, changes in dimension and position of theopening 25 arise, the expansion of the resin mask can be absorbed byforming the grooves, and the grooves can prevent the changes indimension and position of the opening 25 caused by the resin mask 20expanding in a predetermined direction as a whole due to accumulation ofthermal expansions arising in respective spots in the resin mask.Formation positions of the grooves are not limited but while they may beprovided between the openings 25 constituting one screen, and inpositions overlapping the openings 25, they are preferably providedbetween the screens. Further, the grooves may be provided on one surfaceof the resin mask, for example, only on the surface on the side that isin contact with the metal mask, or may be provided only on the surfaceon the side that is not in contact with the metal mask. Alternatively,they may be provided on both surfaces of the resin mask 20.

Further, the grooves extending in the lengthwise direction between theadjacent screens may be made, or the grooves extending in the crosswisedirection may be formed between the adjacent screens. Furthermore, thegrooves can also be formed in an aspect having these grooves combined.

The depths and the widths of the grooves are not specially limited, butsince the rigidity of the resin mask 20 tends to decrease in the casewhere the depths of the grooves are too large and in the case where thewidths thereof are too large, it is necessary to set the depths and thewidths with this point taken into consideration. Further, the sectionalshapes of the grooves are not specially limited, but only has to bearbitrarily selected as a U-shape, a V-shape or the like with theprocessing method and the like taken into consideration. The samesimilarly applies to the vapor deposition mask of Embodiment (B).

As the pressing member 130 which is used when the vapor deposition mask100 and the vapor deposition target 200 are brought into close contactwith each other by using the vapor deposition mask of the aforementionedembodiment (A), the various pressing members 130 described in the abovecan be properly selected and used, but it is preferable to dispose thepressing member 130 in the position overlapping the one screen in thethickness direction so as to be “the mode A of the preferable pressingmember” and “the mode B of the preferable pressing member” describedabove.

<Vapor Deposition Mask of Embodiment (B)>

Next, the vapor deposition mask of Embodiment (B) is described. As shownin FIG. 18, the vapor deposition mask of Embodiment (B) is characterizedin that the vapor deposition mask is formed by stacking the metal mask10 provided with one slit (one hole 16) on one surface of the resin mask20 provided with a plurality of openings 25 corresponding to a patternto be produced by vapor deposition, and all of the plurality of openings25 are provided in a position overlapping the one hole 16 provided inthe metal mask 10.

The opening 25 stated for the vapor deposition mask of Embodiment (B)means an opening needed to form the vapor deposition pattern in thevapor deposition target, and an opening not needed to form the vapordeposition pattern in the vapor deposition target may be provided in aposition that does not overlap the one hole 16. Note that FIG. 18 is anelevation view of the vapor deposition mask showing an example of thevapor deposition mask of Embodiment (B) as seen in plan view from ametal mask side.

In the vapor deposition mask 100 of Embodiment (B), the metal mask 10having the one hole 16 is provided on the resin mask 20 having theplurality of openings 25, and all of the plurality of openings 25 areprovided in a position overlapping the one hole 16. In the vapordeposition mask 100 of Embodiment (B) that has this configuration, metalline portions that have the same thickness as the thickness of the metalmask or a larger thickness than the thickness of the metal mask do notexist between the openings 25, so that, as described for the vapordeposition mask of Embodiment (A) mentioned above, the vapor depositionpattern with high definition can be formed to match the dimensions ofthe openings 25 provided in the resin mask 20 without receiving aninterference of metal line portions.

Further, according to the vapor deposition mask of Embodiment (B), aninfluence of a shadow is hardly received even when the thickness of themetal mask 10 is made large, so that the thickness of the metal mask 10can be made larger to such an extent that durability and handlingability can be sufficiently satisfied, and while formation of a vapordeposition pattern with high definition is enabled, durability andhandling ability can be improved.

The resin mask 20 in the vapor deposition mask of Embodiment (B) isformed from a resin, in which as shown in FIG. 18, the plurality ofopenings 25 corresponding to a pattern to be produced by vapordeposition are provided in positions overlapping the one hole 16. Theopenings 25 correspond to the pattern to be produced by vapordeposition, and by a vapor deposition material released from a vapordeposition source passing through the openings 25, the vapor depositionpattern corresponding to the openings 25 is formed in the vapordeposition target. Note that while in the mode shown in the figure, theexample in which the openings are arranged in a plurality of rows in thelengthwise direction and the crosswise direction is cited and described,they may be arranged only in the lengthwise direction or in thecrosswise direction.

“One screen” in the vapor deposition mask 100 of Embodiment (B) means anaggregate of the openings 25 corresponding to one product, and when theone product is an organic EL display, an aggregate of organic layersneeded to form one organic EL display, in other words, an aggregate ofthe openings 25 to be the organic layers is “one screen”. The vapordeposition mask of Embodiment (B) may be constituted of only “onescreen”, or may be a deposition mask in which the “one screen” isdisposed in each of a plurality of screens, and in the case where the“one screen” is disposed in each of a plurality of screens, the openings25 are preferably provided at predetermined intervals in each screenunit (refer to FIG. 14 for the vapor deposition mask of Embodiment (A)).The mode of “one screen” is not specially limited, but, for example, theone screen can also be constituted of millions of openings 25, when oneopening 25 is one pixel.

The metal mask 10 in the vapor deposition mask 100 of Embodiment (B) isformed from a metal and includes the one hole 16. Further, the one hole16 is disposed in a position overlapping all of the openings 25 as seenfrom a front of the metal mask 10, in other words, in a position whereall of the openings 25 disposed in the resin mask 20 can be seen.

The metal portion constituting the metal mask 10, that is, the portionthereof other than the one hole 16 may be provided along an outer edgeof the vapor deposition mask 100 as shown in FIG. 18, or the dimensionof the metal mask 10 may be made smaller than that of the resin mask 20to expose an outer peripheral portion of the resin mask 20 as shown inFIG. 19. Further, the dimension of the metal mask 10 may be made largerthan that of the resin mask 20, and a part of the metal portion may becaused to protrude outward in the crosswise direction of the resin maskor outward in the lengthwise direction thereof. Note that, in any case,the dimension of the one hole 16 is configured to be smaller than thedimension of the resin mask 20.

A width (W1) in the crosswise direction, and a width (W2) in thelengthwise direction, of the metal portion constituting the wall surfaceof the one hole 16 of the metal mask 10 shown in FIG. 18 are notspecially limited, but as the widths W1 and W2 are made smaller,durability and handling ability tend to reduce more. Accordingly, W1 andW2 are preferably the widths by which durability and handling abilityare sufficiently satisfied. Appropriate widths can be properly set inaccordance with the thickness of the metal mask 10, and as an example ofpreferable widths, both W1 and W2 are about 1 mm to about 100 mm,similarly to the widths of the metal mask in the vapor deposition maskof Embodiment (A).

In the vapor deposition mask of Embodiment (B) mentioned above, themetal mask 10 has the one hole 16, and therefore the vapor depositionmask of Embodiment (B) and the magnetic plate 150 attract each other inonly the metal portion existing on the outer periphery of the metal mask10, so that as compared with the vapor deposition mask of Embodiment (A)mentioned above, a gap generated between the vapor deposition mask 100and the vapor deposition target 200 tends to be larger toward the innerside of the vapor deposition mask 100. Accordingly, in the case of usingthe vapor deposition mask of Embodiment (B), it is preferable to use thepressing member 130 having a relatively large thickness. As the pressingmember 130 which is used in combination with the vapor deposition maskof Embodiment (B), it is preferable to dispose a plurality ofindependent pressing members 130, or the pressing-plate-integrated typepressing member 140 formed by a plurality of pressing members 130 beingfixed to the pressing plate 135 so as to be the aforementioned “mode Aof the preferable pressing member”, or dispose a large-sized pressingmember to be the aforementioned “mode B of the preferable pressingmember”.

(Example of Metal-Frame-Equipped Vapor Deposition Mask)

As the vapor deposition mask for use in the method for forming a vapordeposition pattern of an embodiment, a metal-frame-equipped vapordeposition mask that is formed by the vapor deposition masks of thevarious modes described above being fixed to a metal frame can be alsoused. By using the metal-frame-equipped vapor deposition mask, the vapordeposition mask 100 and the magnetic plate 150 can attract each otheralso in a frame portion of the metal frame, and coupled with the effectby the pressing member 130 described above, adhesion of the vapordeposition mask 100 and the vapor deposition target 200 can be moreenhanced.

The metal-frame-equipped vapor deposition mask 200 for use in the methodfor forming a vapor deposition pattern of an embodiment may be ametal-frame-equipped vapor deposition mask in which one vapor depositionmask 100 is fixed to a metal frame 60 as shown in FIG. 20, or may be ametal-frame-equipped vapor deposition mask in which a plurality of vapordeposition masks 100 are fixed to the metal frame 60 as shown in FIG.21.

The metal frame 60 is a frame member in a substantially rectangularshape, and has a through-hole for exposing the openings 25 provided inthe resin mask 20 of the vapor deposition mask 100 which is finallyfixed, to a vapor deposition source side. Note that when the vapordeposition mask 100 and the magnetic plate 150 can attract each other bythe metal portion of the metal mask 10 of the vapor deposition mask, aframe formed from a material other than the metal material, for example,a frame formed from a ceramics material or the like also can be used,for example.

A thickness of the metal frame is not specially limited, but ispreferably about 10 mm to about 30 mm from the viewpoint of rigidity andthe like. A width between an inner peripheral end surface of an openingof the metal frame and an outer peripheral end surface of the metalframe is not specially limited if only it is a width capable of fixingthe metal frame and the metal mask of the vapor deposition mask, and forexample, a width of about 10 mm to about 70 mm can be exemplified.

Further, as shown in FIGS. 22(a) to 22(c), the metal frame 60 may beused, in which reinforcing frames 65 or the like are provided in aregion of the through-hole of the metal frame within a range withouthindering exposure of the openings 25 of the resin mask 20 constitutingthe vapor deposition mask 100. In other words, the opening of the metalframe 60 may have a structure divided by the reinforcing frames or thelike. By providing the reinforcing frames 65, the metal frame 60 and thevapor deposition mask 100 can be fixed by using the reinforcing frames65. Specifically, when a plurality of vapor deposition masks 100described above are fixed by being arranged in the lengthwise directionand the cross wise direction, the vapor deposition masks 100 can be alsofixed to the metal frame 60 in positions where the reinforcing framesand the vapor deposition masks overlap one another.

Furthermore, by forming the reinforcing frame 65 from a metal material,the metal-frame-equipped vapor deposition mask and the magnetic plate150 can sufficiently attract each other by using the frame body portionof the metal frame and the reinforcing frame 65, and coupled with thepressing member 130, the metal-frame-equipped vapor deposition mask andthe vapor deposition target 200 can be sufficiently brought into closecontact with each other without a gap.

While the method for forming a vapor deposition pattern of an embodimentis described thus far by citing the case of using the vapor depositionmask 100 formed by stacking the metal mask 10 provided with the slits 15and the resin mask 20 provided with the plurality of openings 25corresponding to the pattern to be produced by vapor deposition, in thepositions overlapping the slits 15, as an example, a vapor depositionmask other than this, for example, the vapor deposition mask in whichthe metal mask 10 is disposed in a part of the effective region of theresin mask 20 described above also can be used, for example. As anexample, a vapor deposition mask in which a plurality of metal masks areprovided in the effective region of the resin mask 20 described above,and a vapor deposition mask in which a metal mask is disposed in only aregion requiring rigidity can be cited. Further, a metal mask having noslit also can be used as the metal mask. Note that as the effectiveregion mentioned here, a region that does not overlap the openings 25provided in the resin mask 20, a region that does not overlap the framewhen the vapor deposition mask is fixed to the frame and the like can becited. The method for forming a vapor deposition pattern of anembodiment is characterized in that it includes disposing the vapordeposition mask 100 including a metal on one surface side of the vapordeposition target 200, disposing the magnetic plate 150 on the othersurface side of the vapor deposition target 200, and bringing the vapordeposition mask 100 and the vapor deposition target 200 into closecontact with each other by using the magnetism of the magnetic plate150, and is not limited to the vapor deposition mask described above.That is, the vapor deposition mask may be any vapor deposition mask aslong as the vapor deposition mask includes a metal. As the vapordeposition mask including a metal, a vapor deposition mask in which thematerial of the resin mask 20 provided with a plurality of openings 25corresponding to the pattern to be produced by vapor deposition isreplaced with a metal material, a vapor deposition mask formed by only ametal mask provided with a plurality of openings corresponding to apattern to be produced by vapor deposition and the like can be cited.Other than these vapor deposition masks, a vapor deposition maskincluding a metal can be made by causing a resin mask to contain a metalmaterial to give magnetism to a vapor deposition mask formed of only theresin mask 20 provided with a plurality of openings 25 corresponding toa pattern to be produced by vapor deposition mentioned above.

<Vapor Deposition Pattern Forming Step>

A vapor deposition pattern forming step is a step of causing a vapordeposition material released from the vapor deposition source to adhereto a vapor deposited surface of the vapor deposition target through theopenings 25 provided in the vapor deposition mask 100 after theaforementioned close contact step, and forming a vapor depositionpattern on the vapor deposited surface of the vapor deposition target.

A vapor deposition method usable in the method for forming a vapordeposition pattern of an embodiment is not specially limited, and therecan be cited, for example, a reactive sputtering method, a vacuum vapordeposition method, physical vapor deposition (Physical Vapor Deposition)such as ion plating and an electron beam vapor deposition method,chemical vapor deposition (Chemical Vapor Deposition) such as thermalCVD, plasma CVD and optical CVD methods and the like. Moreover,formation of a vapor deposition pattern can be performed by using aconventionally known vacuum vapor deposition apparatus or the like.

In the vapor deposition pattern forming step, a vapor deposition patternis formed on the vapor deposited surface of the vapor deposition target.In the method for forming a vapor deposition pattern of an embodiment,adhesion between the vapor deposition mask 100 and the vapor depositiontarget 200 can be enhanced and a gap can be restrained from beinggenerated between the vapor deposition mask 100 and the vapor depositiontarget 200, by the close contact step. Consequently, according to themethod for forming a vapor deposition pattern of an embodiment, when avapor deposition material released from a vapor deposition source passesthrough the openings in the vapor deposition pattern forming step, theproblem of the respective vapor deposition patterns which should beformed at predetermined intervals connecting to each other due to thevapor deposition material going around from the gap, or increase in thevapor deposition pattern dimension and the like can be restrained fromoccurring, and a high-definition vapor deposition pattern can be formed.

<Method for Forming Vapor Deposition Pattern of Another Embodiment>

A method for forming a vapor deposition pattern of another embodiment isa method for forming a vapor deposition pattern that forms a vapordeposition pattern in a vapor deposition target by using a vapordeposition mask provided with a plurality of openings corresponding to apattern to be produced by vapor deposition, and as shown in FIG. 23 andFIG. 24, is characterized by including a close contact step of disposingthe vapor deposition mask 100 on one surface side (an undersurface sidein a mode shown in the figures) of the vapor deposition target 200,disposing the pressing member 130 on the other surface side (a topsurface side in the mode shown in the figures) of the vapor depositiontarget 200, and pressing the vapor deposition target 200 to the vapordeposition mask 100 side by the self weight of the pressing member 130to bring the vapor deposition mask 100 and the vapor deposition target200 into close contact with each other, and a vapor deposition patternforming step of causing a vapor deposition material released from avapor deposition source to adhere to the vapor deposition target 200through the openings 25 after the close contact step, and forming avapor deposition pattern in the vapor deposition target 200. FIG. 23 andFIG. 24 are schematic cross-sectional views showing a state in which avapor deposition mask and a vapor deposition target are brought intoclose contact with each other by a self weight of the pressing member130 or the pressing-plate-integrated type pressing member 140, by usingthe pressing member 130, or the pressing-plate-integrated type pressingmember 140.

The method for forming a vapor deposition pattern of another embodimentdiffers from the method for forming a vapor deposition pattern of anembodiment mentioned above in a point that the magnetic plate 150 is notan essential constituent element.

To be specific, the method for forming a vapor deposition pattern ofanother embodiment differs from the method for forming a vapordeposition pattern of an embodiment mentioned above only in

(i) a point that the magnetic plate is not an essential constituentelement

(ii) a point that the pressing member is pressed without using amagnetic plate, and

except for the different points, is common to the method for forming avapor deposition pattern of an embodiment mentioned above. Accordingly,in the method for forming the vapor deposition pattern of anotherembodiment, various aspects described for the method for forming a vapordeposition pattern of an embodiment mentioned above can be properlyselected and used, except for the different points. For example, themode of the pressing member, arrangement positions and the like arecommon to the method for forming a vapor deposition pattern of anembodiment mentioned above.

In the method for forming a vapor deposition pattern of anotherembodiment, the magnetic plate is not an essential constituent element,the pressing member 130 is disposed on the other surface side (the topsurface side in the mode shown in the figures) of the vapor depositiontarget 200, the pressing member 130 is pressed to the vapor depositionmask 100 side by an appropriate device, and the vapor deposition maskand the vapor deposition target are brought into close contact with eachother. Accordingly, in the method for forming a vapor deposition patternof another embodiment, a vapor deposition mask that includes no metal,for example, a vapor deposition mask formed of only the resin mask 20provided with the openings 25 corresponding to a pattern to be producedby vapor deposition also can be used, for example. Note that in themethod for forming a vapor deposition pattern of another embodiment, thevapor deposition masks described in the method for forming a vapordeposition pattern of an embodiment in the above also can be useddirectly. Further, conventionally known vapor deposition masks otherthan these vapor deposition masks also can be properly selected andused.

In the method for forming a vapor deposition pattern of anotherembodiment, a method for pressing the pressing member 130 disposed onthe other surface side of the vapor deposition target 200 to the vapordeposition mask 100 side is not specially limited, and there can becited the method for pressing the pressing member 130 to the vapordeposition mask 100 side by the self weight of the pressing member 130,a method for pressing the pressing member 130 to the vapor depositionmask 100 side by holding the pressing member 130 with a driving device,and driving the driving device which holds the pressing member, and thelike. Further, in place of the method for holding the pressing member130 with the driving devise, a driving device is brought into contactwith the pressing member 130, and the driving device which is broughtinto contact with the pressing member 130 is driven toward the vapordeposition mask 100 side, whereby the pressing member 130 also can bepressed to the vapor deposition mask 100 side. Further, pressing thepressing member 130 to the vapor deposition mask side mentioned in thespecification of the present application also includes a mode ofpressing the vapor deposition mask 100 toward the pressing member 130side, in addition to the mode of pressing the pressing member 130 towardthe vapor deposition mask 100 side. For example, the vapor depositionmask 100 is held by the driving device, or the vapor deposition mask 100is brought into contact with the driving device, and the driving devicemay be driven toward the pressing member 130 side.

While a mass and a dimension of the pressing member 130 in the case ofusing the method for pressing the pressing member 130 to the vapordeposition mask 100 side by the self weight of the pressing member arenot specially limited, the mass and the dimension only have to be atleast the mass and dimension by which the vapor deposition target 200can be pressed to the vapor deposition mask 100 side by the self weightthereof. The mass and the dimension of the pressing member 130 can beproperly set in accordance with the material of the vapor depositiontarget 200, the thickness of the vapor deposition target 200 and thelike. As a material of the pressing member 130, use of a material havinga mass per unit volume of about 2.0 g/cm³ or more is preferable, and useof a material having a mass per unit volume of about 2.5 g/cm³ or moreis more preferable, for example.

Moreover, as shown in FIG. 23, when the pressing members 130 areindividually disposed on the other surface side of the vapor depositiontarget 200, the mass of each of the pressing members 130 is preferablyabout 50 g or more, and is more preferably about 100 g or more.

Note that as shown in FIG. 24, the case of using thepressing-plate-integrated type pressing member 140 formed by fixing oneor a plurality of pressing members 130 to the pressing plate 135 (in amode shown in the figure, a plurality of pressing members 130 are fixedto the pressing plate 135) is preferable in a viewpoint of being able toincrease the entire mass. Further, the pressing members 130 can beaccurately disposed on the other surface side of the vapor depositiontarget 200.

Moreover, in a case where a force that presses the vapor depositiontarget 200 to the vapor deposition mask 100 side by the pressing member130 is weak or the like, a weight (not shown in the figure) is placed onthe pressing member 130, the pressing plate 135 or thepressing-plate-integrated type pressing member 140, and the pressingforce can be made strong.

Further, by using a drive mechanism, the pressing member 130 disposed onthe other surface side of the vapor deposition target 200 also can bepressed to the vapor deposition mask side. The drive mechanism only hasto have a function of being able to hold the pressing member 130, andbeing able to move the held pressing member 130 in an arbitrarydirection.

<<Pressing-Plate-Integrated Type Pressing Member>>

Next, the pressing-plate-integrated type pressing member of anembodiment of the present disclosure (Hereafter, referred to as thepressing-plate-integrated type pressing member of an embodiment.) isdescribed. The pressing-plate-integrated type pressing member of anembodiment is (1) a pressing-plate-integrated type pressing member thatis disposed between a vapor deposition target and a magnetic plate whena vapor deposition mask is disposed on one surface side of the vapordeposition target, the magnetic plate is disposed on the other surfaceside of the vapor deposition target, and the vapor deposition target andthe vapor deposition mask are brought into close contact with each otherby using the magnetic force of the magnetic plate, or (2) apressing-plate-integrated type pressing member that is disposed on theother surface side of the vapor deposition mask when the vapordeposition mask is disposed on the one surface side of the vapordeposition target, and is used to bring the vapor deposition target andthe vapor deposition mask into close contact with each other by usingthe self weight thereof, and is characterized by being thepressing-plate-integrated type pressing member 140 in which one or aplurality of pressing members 130 are provided on a surface of thepressing plate 135. According to the pressing-plate-integrated typepressing member of an embodiment, the pressing-plate-integrated typepressing member is disposed between the vapor deposition target and themagnetic plate, and the vapor deposition mask 100 and the vapordeposition target 200 are brought into close contact with each other,whereby a gap can be restrained from being generated between the vapordeposition mask and the vapor deposition target. Further, without usingthe magnetic plate, the vapor deposition mask 100 and the vapordeposition target 200 can be brought into close contact with each otherwithout a gap by pressing the pressing-plate-integrated type pressingmember 140 to the vapor deposition mask 100 side by using the selfweight of the pressing-plate-integrated type pressing member 140disposed on the other surface side of the vapor deposition target 200,or driving the drive mechanism holding the pressing-plate-integratedtype pressing member.

As the pressing-plate-integrated type pressing member of an embodiment,the pressing-plate-integrated type pressing member 140 described in themethod for forming a vapor deposition pattern mentioned above can bedirectly used, and detailed explanation is omitted here.

The pressing member 130 and the pressing plate 135 which constitute thepressing-plate-integrated type pressing member 140 may be respectivelyformed from different materials, or the same kind of material. Further,the pressing member 130 and the pressing plate 135 may be formed fromthe same kind of material, and formed integrally with each other.

<<Vapor Deposition Apparatus>>

Next, a vapor deposition apparatus of an embodiment of the presentdisclosure (Hereafter, referred to as a vapor deposition apparatus of anembodiment.) is described. The vapor deposition apparatus of anembodiment is a vapor deposition apparatus for forming a vapordeposition pattern on a vapor deposition target, and has a feature in apoint of including a close contact device for bringing the vapordeposition target and a vapor deposition mask into close contact witheach other in a stage before forming the vapor deposition pattern on thevapor deposition target, wherein the close contact device is (1) adevice that disposes the vapor deposition mask on one surface side ofthe vapor deposition target, disposes a pressing member and a magneticplate in layer in this order on the other surface side of the vapordeposition target, and brings the vapor deposition target and the vapordeposition mask into close contact with each other by using magnetism ofthe magnetic plate, or is (2) a device that disposes the vapordeposition mask on one surface side of the vapor deposition target,disposes the pressing member on the other surface side of the vapordeposition target, and presses the pressing member to the vapordeposition mask side to bring the vapor deposition target and the vapordeposition mask into close contact with each other. In (2), by the selfweight of the pressing member, or driving a driving device that holdsthe pressing member, for example, the pressing member is disposed on theother surface side of the vapor deposition target, and the pressingmember can be pressed to the vapor deposition mask side.

That is, the aforementioned vapor deposition apparatus is characterizedby including a mechanism for performing the close contact step describedin the methods for forming a vapor deposition pattern of an embodimentmentioned above and another embodiment. As for the portions other thanthe close contact device, the respective components of theconventionally known vapor deposition mask producing apparatus can beproperly selected and used. According to the vapor deposition apparatusof an embodiment, in the step before forming the vapor depositionpattern in the vapor deposition target, the vapor deposition mask andthe vapor deposition target can be brought into close contact with eachother without a gap, and a high-definition vapor deposition pattern canbe formed.

<<Method for Producing Organic Semiconductor Element>>

Next, a method for producing an organic semiconductor element of anembodiment of the present disclosure (Hereafter, referred to as a methodfor producing an organic semiconductor element of an embodiment.) isdescribed. A method for producing an organic semiconductor element of anembodiment is characterized by including a step of forming a vapordeposition pattern in a vapor deposition target by using a vapordeposition mask, wherein in the step of forming the vapor depositionpattern, the method for forming a vapor deposition pattern of anembodiment mentioned above, and the vapor deposition apparatus of anembodiment described above are used.

The step of forming a vapor deposition pattern by a vapor depositionmethod using a vapor deposition mask is not specially limited, and anelectrode forming step of forming an electrode on a substrate, anorganic layer forming step, a counter electrode forming step, a sealinglayer forming step and the like are included, and in each of arbitrarysteps, the vapor deposition pattern is formed by using the method forforming a vapor deposition pattern of an embodiment described above. Forexample, when the method for forming a vapor deposition pattern of anembodiment described above is applied respectively to a light emittinglayer forming step of respective colors of R (red), G (green) and B(blue) of an organic EL device, vapor deposition patterns of the lightemitting layers of the respective colors are formed on the substrate.Note that the method for producing an organic semiconductor element ofan embodiment is not limited to these steps, but is applicable to anarbitrary step in production of an organic semiconductor element that isconventionally known.

According to the method for producing an organic semiconductor elementof an embodiment described above, vapor deposition for forming anorganic semiconductor element can be performed in a state where thevapor deposition mask and the vapor deposition target are brought intoclose contact with each other without a gap, and a high-definitionorganic semiconductor element can be produced. As an organicsemiconductor element produced by the method for producing an organicsemiconductor element of an embodiment, an organic layer, a lightemitting layer, a cathode electrode and the like of an organic ELelement can be cited, for example. In particular, the method forproducing an organic semiconductor element of an embodiment can bepreferably used in production of R (red), G (green) and B (blue) lightemitting layers of an organic EL element from which high-definitionpattern precision is required. Moreover, an organic semiconductor devicealso can be produced by using the organic semiconductor element formedby using the method for producing an organic semiconductor element of anembodiment.

REFERENCE SIGNS LIST

-   10 Metal mask-   15 Slit-   20 Resin mask-   25 Opening-   60 Metal frame-   100 Vapor deposition mask-   130 Pressing member-   135 Pressing plate-   140 Pressing-plate-integrated type pressing member-   150 Magnetic plate-   200 Vapor deposition target

1. A method for forming a vapor deposition pattern using a vapordeposition mask provided with a plurality of openings corresponding to apattern that is produced by vapor deposition, and forming the pattern ona vapor deposition target, wherein the vapor deposition mask includes ametal, the method comprising: a close contact step of disposing thevapor deposition mask on one surface side of the vapor depositiontarget, disposing a pressing member and a magnetic plate in layer inthis order on the other surface side of the vapor deposition target, andusing magnetism of the magnetic plate to bring the vapor depositiontarget and the vapor deposition mask into close contact with each other;and a vapor deposition pattern forming step of causing a vapordeposition material released from a vapor deposition source to adhere tothe vapor deposition target through the openings after the close contactstep, and forming a vapor deposition pattern on the vapor depositiontarget.